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Etching of Polyester Films

IP.com Disclosure Number: IPCOM000076126D
Original Publication Date: 1972-Jan-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Morgan, WM: AUTHOR

Abstract

Fine lines are etched in thin sheets of polyethylene terephthalate, nylons or polyacetals with hexafluoro acetone sesquihydrate (HFAS) which is a selective solvent for polymers containing carbonyl carbon atoms. The thin sheets to be etched are first coated with KTFR* which being based on poly-cis-isoprene is not attacked by HFAS. The resist is treated in the usual way to form a mask selectively exposing the thin sheets in the required pattern. Etching through the KTFR mask is then conducted with HFAS at room temperature. * Product of Eastman Kodak Co.

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Etching of Polyester Films

Fine lines are etched in thin sheets of polyethylene terephthalate, nylons or polyacetals with hexafluoro acetone sesquihydrate (HFAS) which is a selective solvent for polymers containing carbonyl carbon atoms. The thin sheets to be etched are first coated with KTFR* which being based on poly-cis-isoprene is not attacked by HFAS. The resist is treated in the usual way to form a mask selectively exposing the thin sheets in the required pattern. Etching through the KTFR mask is then conducted with HFAS at room temperature. * Product of Eastman Kodak Co.

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