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Liquid Interface for Photoresist

IP.com Disclosure Number: IPCOM000076237D
Original Publication Date: 1972-Feb-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Haining, FW: AUTHOR [+2]

Abstract

By substituting a liquid such as oil for the protective MYLAR* layer on the film-type photoresist, RISTON**, the severity of image distortion due to poor light collimation, refraction and reflection is significantly reduced.

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Liquid Interface for Photoresist

By substituting a liquid such as oil for the protective MYLAR* layer on the film-type photoresist, RISTON**, the severity of image distortion due to poor light collimation, refraction and reflection is significantly reduced.

The protective layer is removed after the photoresist is in place and a quantity of oil is applied at the center of the pattern area. With the glass master on the oil, the assembly is placed in a vacuum frame. When the vacuum is turned on, the glass master and the photoresist are pressed together. This removes the air pockets and permits the oil to spread over the photoresist surface for subsequent exposure.

The oil interface allows closer spacing between the photoresist and glass master, with resultant improvement in image reproduction, and facilitates separation after exposure. The oil, such as mineral oil, should match the index of refraction of the glass, if possible. * & ** Trademarks of E. I. du Pont de Nemours & Co.

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