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Ion Bombardment to Change Physical Properties of Organic Polymers

IP.com Disclosure Number: IPCOM000076459D
Original Publication Date: 1972-Mar-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Kleinfelder, WJ: AUTHOR [+2]

Abstract

Temperature and corrosion resistance of cross-linkable polymer photoresist films are greatly increased by bombardment with high-energy ions having an energy above about 10 Kev. Such bombardment also enhances the adherence of these photoresist polymer films to metallic and semiconductor substrates, so that the bombarded films can be used as insulating layers in integrated circuit devices.

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Ion Bombardment to Change Physical Properties of Organic Polymers

Temperature and corrosion resistance of cross-linkable polymer photoresist films are greatly increased by bombardment with high-energy ions having an energy above about 10 Kev. Such bombardment also enhances the adherence of these photoresist polymer films to metallic and semiconductor substrates, so that the bombarded films can be used as insulating layers in integrated circuit devices.

To produce an insulating layer in a selected pattern, a photoresist polymer film previously formed on a substrate is exposed image-wise to actinic radiation and then etched to remove unhardened portions. The remaining photoresist pattern is then bombarded with ions which have been accelerated in a high- voltage accelerator to energies of at least about 10 Kev.

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