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Exhaust Control of Thermal Induced Vapor Systems

IP.com Disclosure Number: IPCOM000076465D
Original Publication Date: 1972-Mar-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 2 page(s) / 19K

Publishing Venue

IBM

Related People

DeFries, RM: AUTHOR

Abstract

When dealing with an anhydrous dopant input impurity, e.g., (P(2)O(5) from a POCl(3) source gas at inlet 2, in a reactor 3, it was found that the exhaust 1 extension cross-sectional area is restricted by condensation of these vapors, thus reducing the laminar flow from the exhaust port. This phenomenon slows down total flow, thus lowering the sheet resistance values which is found proportional to the reduction in exhaust cross-sectional area due to such condensed vapors.

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Exhaust Control of Thermal Induced Vapor Systems

When dealing with an anhydrous dopant input impurity, e.g., (P(2)O(5) from a POCl(3) source gas at inlet 2, in a reactor 3, it was found that the exhaust 1 extension cross-sectional area is restricted by condensation of these vapors, thus reducing the laminar flow from the exhaust port. This phenomenon slows down total flow, thus lowering the sheet resistance values which is found proportional to the reduction in exhaust cross-sectional area due to such condensed vapors.

By heating of the exhaust extension 1 by a suitable heating wire 5, the exhaust temperature may be maintained above the sublimination temperature of P(2)O(5) (347 Degrees C) to minimize excessive condensation on the inside walls of the exhaust tubing.

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