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Release Coating for Photomasks

IP.com Disclosure Number: IPCOM000076493D
Original Publication Date: 1972-Mar-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Anschel, M: AUTHOR [+2]

Abstract

A release coating of decafluorohexylmethacrylate is compatible, i.e., highly inert, with metals, glass and resist materials. It gives clean, fast, contaminant free separations of glass-metal photomasks from high-adhesion photosensitive polymers, photoresists. Such masks and photoresists are utilized in printed circuit and matrix fabrication. Both coating and photomask reuse is possible after the coating is removed from the mask.

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Release Coating for Photomasks

A release coating of decafluorohexylmethacrylate is compatible, i.e., highly inert, with metals, glass and resist materials. It gives clean, fast, contaminant free separations of glass-metal photomasks from high-adhesion photosensitive polymers, photoresists. Such masks and photoresists are utilized in printed circuit and matrix fabrication. Both coating and photomask reuse is possible after the coating is removed from the mask.

Decafluorohexylmethacrylate synthesized by reacting methacrylyl chloride and octafluoropentanol (1,1,5-trihydroperfluoropentanol) in the presence of benzoyl peroxide catalyst is dissolved in truchliritrifluoroethane. The resulting solution (Approx. 2.5% solid content) is appropriately applied (e.g., sprayed) onto the photomask to give a thin film (< 0.1 mil thick). The exposed photoresist is not adversely affected by the protective coating and no photoresist is observed to cling to the photomask. To remove the protective coating for future photomask and reclaimed coating usage, fluorinated mask compatible solvents such as trichlorotrifluoroethane are employed.

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