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Homogeneous Film Evaporation of Differing Vapor Pressure Materials

IP.com Disclosure Number: IPCOM000076582D
Original Publication Date: 1972-Mar-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 2 page(s) / 29K

Publishing Venue

IBM

Related People

Effron, MS: AUTHOR

Abstract

A continuous feed of a high-vapor pressure material to the surface of a low-vapor pressure material during evaporation is a convenient way to provide uniform, homogeneous multicomponent evaporated films. Shown is a water-cooled hearth 10 containing a low-vapor pressure material 12, such as tin, which is heated to evaporation temperature by electron beam 14 from filament 16.

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Homogeneous Film Evaporation of Differing Vapor Pressure Materials

A continuous feed of a high-vapor pressure material to the surface of a low- vapor pressure material during evaporation is a convenient way to provide uniform, homogeneous multicomponent evaporated films. Shown is a water- cooled hearth 10 containing a low-vapor pressure material 12, such as tin, which is heated to evaporation temperature by electron beam 14 from filament 16.

Tube 18 supplies a continuous feed of high-vapor pressure material 20, such as lead, to the surface of low-vapor pressure material 12. In essence, the low- vapor pressure material 12 acts as a heat source for flash evaporation of high- vapor pressure material 20, while itself also undergoes evaporation. The result is a homogeneous film 22 of lead and tin on substrate 24.

The total rate of evaporation, and thus film formation, can be adjusted by increasing or decreasing the ratio between the power supplied by electron beam 14 to hearth 10 and the feed rate of high-vapor pressure material 20. The relative concentrations of each constituent can be adjusted by varying the feed rate of the high-vapor pressure material 20, while maintaining the power supplied by electron beam 14 to hearth 10 constant.

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