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Tungsten Hybrid Mask

IP.com Disclosure Number: IPCOM000076614D
Original Publication Date: 1972-Mar-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Anderson, LC: AUTHOR

Abstract

Photolithographic masks, equivalent to but considerably harder and more abrasion resistant than High Resolution Photographic plates (ERP) obtained from silver-halide emulsions, are created by: 1) Subjecting patterned and fully processed HRP plates to heat (hydrogen furnace, 500 degrees C), causing the emulsion to burn off and the patterned silver to partially diffuse into the glass substrate. 2) The product of step (1) is placed in a WF(6) Chemical Vapor Deposition (CVD) unit. Deposits of tungsten form thereby in a selective pattern, confined to glass surface areas bearing the diffused (patterned) silver and not elsewhere. Since tungsten is opaque at 1000 Angstrom (O.D. greater than 2.0), the patterned tungsten film deposit is equivalent in utility to a chrome on glass photolithographic mask although less costly to fabricate.

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Tungsten Hybrid Mask

Photolithographic masks, equivalent to but considerably harder and more abrasion resistant than High Resolution Photographic plates (ERP) obtained from silver-halide emulsions, are created by: 1) Subjecting patterned and fully processed HRP plates to heat (hydrogen furnace, 500 degrees C), causing the emulsion to burn off and the patterned silver to partially diffuse into the glass substrate. 2) The product of step (1) is placed in a WF(6) Chemical Vapor Deposition (CVD) unit. Deposits of tungsten form thereby in a selective pattern, confined to glass surface areas bearing the diffused (patterned) silver and not elsewhere. Since tungsten is opaque at 1000 Angstrom (O.D. greater than 2.0), the patterned tungsten film deposit is equivalent in utility to a chrome on glass photolithographic mask although less costly to fabricate.

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