Browse Prior Art Database

Self Cleaning Centrifuge

IP.com Disclosure Number: IPCOM000076706D
Original Publication Date: 1972-Apr-01
Included in the Prior Art Database: 2005-Feb-24
Document File: 2 page(s) / 63K

Publishing Venue

IBM

Related People

Gupta, LD: AUTHOR [+4]

Abstract

The inside drum of a wafer drying centrifuge is equipped with a self-cleaning system of water and nitrogen.

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Self Cleaning Centrifuge

The inside drum of a wafer drying centrifuge is equipped with a self-cleaning system of water and nitrogen.

The centrifuge 1 has an outer drum 2, in which is mounted for rotation, stainless steel basket 3 having wafer carrier holders 4. Wafer carriers 5 are pivotally held by holders 4 so that carriers 5 are brought to a vertical position during operation of centrifuge 1. Basket 3 is attached to shaft housing 6. Top 7 of centrifuge 1 is provided with jets 8 for deionized water and nitrogen. Perforated mesh filter 9 retains chipped silicon dust and other contaminant particles. In operation, deionized water for jets 8 periodically rinses dust particles from the inner wall 10 of drum 2 to keep it clean. Hot nitrogen is alternately provided through jets 8 to dry the wafers, keep dust off of the wafers and avoid oxide formation. An outlet 11 for water or gas is provided at the bottom of centrifuge 1.

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