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Surface Preparation of Epitaxial Garnet Films

IP.com Disclosure Number: IPCOM000077206D
Original Publication Date: 1972-Jun-01
Included in the Prior Art Database: 2005-Feb-25
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Almasi, GS: AUTHOR [+2]

Abstract

The common surface imperfections of garnet films fabricated by sputtering, chemical vapor deposition and liquid phase epitaxy methods are mesas, second-phase precipitates, scratches, spalls, granularity and etch pits.

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Surface Preparation of Epitaxial Garnet Films

The common surface imperfections of garnet films fabricated by sputtering, chemical vapor deposition and liquid phase epitaxy methods are mesas, second- phase precipitates, scratches, spalls, granularity and etch pits.

Polishing of the film surfaces is achieved with the colloidal suspension of an abrasive that is softer than garnet and is maintained in an alkaline medium. Approximately one to three hours of such polishing on nonwoven cloth results in the removal of 0.1 mil to 0.3 mil of the surface layer.

The thus polished surfaces are fairly flat and have a mirror finish. There is no significant damage done to the surface of the film as attested by sharp electron diffraction spots obtained from polished surfaces. The capability of salvaging films by a post-deposition polishing procedure is significant, especially for large- area substrates. The polishing procedure described here is beneficial in correcting nonuniformities in thickness.

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