Browse Prior Art Database

Solid State Scanning Device

IP.com Disclosure Number: IPCOM000077518D
Original Publication Date: 1972-Aug-01
Included in the Prior Art Database: 2005-Feb-25
Document File: 2 page(s) / 25K

Publishing Venue

IBM

Related People

Herd, HH: AUTHOR

Abstract

The drawing shows a single solid state scanner that may be extended to form a series of scanners, which employ small holes in the order of one micron rather than using lenses. The holes may be formed by chemical machining techniques.

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Solid State Scanning Device

The drawing shows a single solid state scanner that may be extended to form a series of scanners, which employ small holes in the order of one micron rather than using lenses. The holes may be formed by chemical machining techniques.

The scanner consists of a plurality of layers of different materials. The uppermost layer 10 is a photoconductive junction of photoresistive materials such as a photoconductive junction or phototransistor, depending on the application. Underneath layer 10 is an insulating and bonding layer 12 of silicon dioxide. Next, there is a thin opaque masking layer 14 of chromium, having a slit or hole etched therein, which serves as an aperture stop. Under the chromium layer 14 is another insulating layer 16 of chromium, beneath which is a glass layer 18 having a thickness chosen to provide the correct spacing between aperture and field stops. Next, there is provided the correct spacing between aperture and slit or hole etched therein to provide a field stop. A final transparent protective layer 22 of silicon dioxide forms the bottom of the scanners. To control unwanted light in the glass, the lateral surfaces of the scanner are covered with a solid layer 24 of the same index of refraction as the glass and bonded with an absorber. Layer 24 may be plastic paint loaded with a dye whose absorption maxima occurs at the wavelength of the light which powers the device.

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