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Screenable Photoresist

IP.com Disclosure Number: IPCOM000077564D
Original Publication Date: 1972-Aug-01
Included in the Prior Art Database: 2005-Feb-25
Document File: 2 page(s) / 20K

Publishing Venue

IBM

Related People

Best, B: AUTHOR [+4]

Abstract

In the drawing, a relatively thick photoresist layer 2 is applied to a conductive metal layer 3 that is formed on a substrate 4. The photoresist comprises a commercially available liquid resist into which is mixed glass powder. The glass powder thickens the resist so that it can be applied in thicker layers. Ground quartz is a suitable material and transmits the frequency of light required for exposing the resist.

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Screenable Photoresist

In the drawing, a relatively thick photoresist layer 2 is applied to a conductive metal layer 3 that is formed on a substrate 4. The photoresist comprises a commercially available liquid resist into which is mixed glass powder. The glass powder thickens the resist so that it can be applied in thicker layers. Ground quartz is a suitable material and transmits the frequency of light required for exposing the resist.

The glass particles can be in various form and fine particles permit finer resolution. The resist provides the advantages of liquid resists and overcomes the problems of other methods of obtaining a thick resist.

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