Browse Prior Art Database

Securing Intimate Contact Between Artwork Contact Masks and Nonplanar Surfaces

IP.com Disclosure Number: IPCOM000077567D
Original Publication Date: 1972-Aug-01
Included in the Prior Art Database: 2005-Feb-25
Document File: 2 page(s) / 46K

Publishing Venue

IBM

Related People

Rich, DW: AUTHOR [+3]

Abstract

Fig. 1 characterizes a problem of tolerance displacement associated with contact photoprinting upon nonplanar surfaces. Substrate 1 supports metal layer 2 having elevated elements 4 (e,g. plated deposits added to layer 2 by prior processing). Surfaces 2, 4 are coated with photosensitive (resist) layer 3. Contact photomask 5 contains artwork 6, consisting of transparent and opaque elements registered with depressed surfaces of the layer 3, but separated therefrom by the gap due to the elements 4.

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Securing Intimate Contact Between Artwork Contact Masks and Nonplanar Surfaces

Fig. 1 characterizes a problem of tolerance displacement associated with contact photoprinting upon nonplanar surfaces. Substrate 1 supports metal layer 2 having elevated elements 4 (e,g. plated deposits added to layer 2 by prior processing). Surfaces 2, 4 are coated with photosensitive (resist) layer 3. Contact photomask 5 contains artwork 6, consisting of transparent and opaque elements registered with depressed surfaces of the layer 3, but separated therefrom by the gap due to the elements 4.

This gap may be eliminated, for improved accuracy/fidelity of exposure, by preprocessing the mask 5 to,include voids, openings or depressions 7 (Fig. 2) which complement elements 4 of the photoprint object. The voids may be preformed in the master 5 by mechanical tooling, etching, etch bleach processing (for photographic emulsion layers), etc.

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