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Method for Repairing Hard Mask

IP.com Disclosure Number: IPCOM000077810D
Original Publication Date: 1972-Sep-01
Included in the Prior Art Database: 2005-Feb-25
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Chand, N: AUTHOR

Abstract

Pinholes and breaks in a hard mask, typically chromium or the like, can be repaired easily and quickly by a back filling and coloring of the voids with a material, typically a photoresist or related materials.

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Method for Repairing Hard Mask

Pinholes and breaks in a hard mask, typically chromium or the like, can be repaired easily and quickly by a back filling and coloring of the voids with a material, typically a photoresist or related materials.

Generally, mask segments are made on high resolutions emulsion plates which tend to pick up foreign particles rather readily, when the associated gelatin is swollen in water. The foreign particles are many times impossible to remove without damaging the gelatin and the mask segment. Repairing techniques are available for chrome mask, but these have been found to be expensive and subject the mask to further imperfections.

An efficient technique is to make a chrome or hard copy of the segment and cover the segment with negative photoresist. Next, expose the resist only in the areas where the clear defects exist. The polymerized resist over the clear defects may be dyed, if necessary, to maintain opaqueness to the exposing light.

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