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Controlling the Thickness of Cr(2)O(3) Films on Cr

IP.com Disclosure Number: IPCOM000077837D
Original Publication Date: 1972-Sep-01
Included in the Prior Art Database: 2005-Feb-25
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Brusic, V: AUTHOR [+2]

Abstract

The compound C(r)O(3) is used in multilayer metal-(Cr) glass structures because it exhibits a good adhesion to glass, passivation of the metal and limited solubility in the adjacent layers. A method for the preparation of the compound Cr(2)O(3) in thin films in which the thickness can easily be controlled is as follows:

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Controlling the Thickness of Cr(2)O(3) Films on Cr

The compound C(r)O(3) is used in multilayer metal-(Cr) glass structures because it exhibits a good adhesion to glass, passivation of the metal and limited solubility in the adjacent layers. A method for the preparation of the compound Cr(2)O(3) in thin films in which the thickness can easily be controlled is as follows:

1) Evaporated Cr films of 1000 Angstroms on glass are cleaned ultrasonically in a MICRO* cleaning solution, washed in deionized water and nitrogen dried.

2) A 2 molar to 4 molar aqueous solution of CrO(3) is spin-dried on the clean Cr surface.

3) The sample is heated at 300 degrees C in a vacuum of 2 x 10/-5/ torr for 1 hour, in order to convert CrO(3) into Cr(2)O(3).

The thickness of the Cr(2)O(3) films prepared in this manner is controlled by the concentration of the CrO(3) solution and spinning rate and time. For example, films of 700 Angstroms in thickness are formed using a 2 molar solution of CrO(3) and spinning at 3000 rpm for 20 sec. * Product of International Products Corp., Trenton, N.J.

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