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Polyalkylthiomethacrylates as Positive Electron Beam Resists

IP.com Disclosure Number: IPCOM000078005D
Original Publication Date: 1972-Oct-01
Included in the Prior Art Database: 2005-Feb-25
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Gipstein, E: AUTHOR

Abstract

Positive acting high-speed electron beam sensitive polymers are needed for fabrication of microelectronic components. polymethylthiomethacrylate and poly-t-butylthiomethacrylate polymers have speeds of 5 x 10/-5/ coulombs/cm/2/ and, therefore, represent a new class of polymers suitable for electron beam technology.

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Polyalkylthiomethacrylates as Positive Electron Beam Resists

Positive acting high-speed electron beam sensitive polymers are needed for fabrication of microelectronic components. polymethylthiomethacrylate and poly- t-butylthiomethacrylate polymers have speeds of 5 x 10/-5/ coulombs/cm/2/ and, therefore, represent a new class of polymers suitable for electron beam technology.

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