Browse Prior Art Database

Metal Etchant

IP.com Disclosure Number: IPCOM000078743D
Original Publication Date: 1973-Feb-01
Included in the Prior Art Database: 2005-Feb-26
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Harvilchuck, JM: AUTHOR [+2]

Abstract

An improved phosphoric-nitric acid etching solution for etching of aluminum or aluminum-copper films can be obtained by the addition of 3M Corporation's F.C.-170 Fluorochemical Surfactant.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 1

Metal Etchant

An improved phosphoric-nitric acid etching solution for etching of aluminum or aluminum-copper films can be obtained by the addition of 3M Corporation's F.C.-170 Fluorochemical Surfactant.

The wetting action of the F.C.-170 appears to effect more efficient bubble release from the film surface during etching and conversely, eliminates residual film bridging at the sites of adherent bubbles. Generally, to eliminate the residual bridging heretofore in narrowly spaced patterns, overetching was required which, however, contributed to undercutting and poor dimensional control.

1