Browse Prior Art Database

RF Power Network for Sputtering Apparatus

IP.com Disclosure Number: IPCOM000078764D
Original Publication Date: 1973-Mar-01
Included in the Prior Art Database: 2005-Feb-26
Document File: 2 page(s) / 27K

Publishing Venue

IBM

Related People

Anderson, JP: AUTHOR [+2]

Abstract

This network makes possible for a given coax cable, the transmission of power to either a larger substrate holder or second target, or a larger power density to the electrode.

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RF Power Network for Sputtering Apparatus

This network makes possible for a given coax cable, the transmission of power to either a larger substrate holder or second target, or a larger power density to the electrode.

In the schematic diagram shown. sputtering chamber 10 has a target electrode 12 and a second electrode 14, which can be either a substrate holder or a second target electrode. An RF power source 16 is provided which conducts power through a coax cable 18, to a matching network. consisting of an inductance element 20 and variable capacitors 22 and 24 for driving target 12. Power is tapped off at point 26, or other appropriate points by a coax cable 28 for driving the substrate holder 14. Variable capacitor 30 is provided to adjust the power density or voltage of the electrode 14. Conductor 32 is used to shunt some of the current that flows to the electrode or substrate holder 14.

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