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Testing Hardness of a Thin Film Material

IP.com Disclosure Number: IPCOM000078884D
Original Publication Date: 1973-Mar-01
Included in the Prior Art Database: 2005-Feb-26
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Kirkman, DH: AUTHOR [+2]

Abstract

A method of determining the hardness H of a thin film material deposited on a substrate comprises the steps of producing a series of scratches in the film with a number of spherical styli of progressively decreasing radii, each having a constant load L applied thereto. The radii of the styli with the smallest radius produces a scratch which almost penetrates through the film.

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Testing Hardness of a Thin Film Material

A method of determining the hardness H of a thin film material deposited on a substrate comprises the steps of producing a series of scratches in the film with a number of spherical styli of progressively decreasing radii, each having a constant load L applied thereto. The radii of the styli with the smallest radius produces a scratch which almost penetrates through the film.

The widths of the scratches W produced are determined by measuring the distance between the high boundaries of displaced material on the edges of the scratches, using a microscope or an interferometer. Hardness is determined from the following expression: H = constant X L/W/2/.

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