Dismiss
InnovationQ will be updated on Sunday, Oct. 22, from 10am ET - noon. You may experience brief service interruptions during that time.
Browse Prior Art Database

Gradient Reversal Terminating of Liquid Phase Epitaxial Growth

IP.com Disclosure Number: IPCOM000078977D
Original Publication Date: 1973-Apr-01
Included in the Prior Art Database: 2005-Feb-26
Document File: 2 page(s) / 62K

Publishing Venue

IBM

Related People

Potemski, RM: AUTHOR [+2]

Abstract

Despite continued attention, there is as yet no method broadly applicable for the termination of growth in liquid phase epitaxy systems. Wiping is not always effective when used in the linear sliding systems during the growth of multilayered structures. It also adds design restraints in rotating systems which cannot always be met. Additionally, in the isothermal melt-mixing mode of growth, there must be a carry-over of melt from melt-to-melt, hence wiping is not possible. Dilution systems leave nonspecific oxide surfaces which require treatment of some sort before processing. The following shows a technique of liquid phase epitaxial growth termination which produces stable, high-quality surfaces and is applicable to nearly all of the currently used techniques including the horizontal slide system.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 59% of the total text.

Page 1 of 2

Gradient Reversal Terminating of Liquid Phase Epitaxial Growth

Despite continued attention, there is as yet no method broadly applicable for the termination of growth in liquid phase epitaxy systems. Wiping is not always effective when used in the linear sliding systems during the growth of multilayered structures. It also adds design restraints in rotating systems which cannot always be met. Additionally, in the isothermal melt-mixing mode of growth, there must be a carry-over of melt from melt-to-melt, hence wiping is not possible. Dilution systems leave nonspecific oxide surfaces which require treatment of some sort before processing. The following shows a technique of liquid phase epitaxial growth termination which produces stable, high-quality surfaces and is applicable to nearly all of the currently used techniques including the horizontal slide system.

To produce good liquid phase epitaxial layers, it is necessary to maintain a positive temperature gradient with respect to the substrate solid-liquid interface,
i.e., the substrate is cooler than the melt. If this condition is reversed, i.e., the substrate is hotter than the melt, the substrate then acts as a nutrient for growth in the cooler part of the system. The present technique applies this effect to terminate growth on the substrate by gradient reversal. Basically, the method is to reverse the gradient while the substrate and melt are still in contact at high temperature. Then, the system is fast cool...