Browse Prior Art Database

Vacuum Chuck for Partial Semiconductor Wafers

IP.com Disclosure Number: IPCOM000079040D
Original Publication Date: 1973-Apr-01
Included in the Prior Art Database: 2005-Feb-26
Document File: 2 page(s) / 46K

Publishing Venue

IBM

Related People

Segal, Z: AUTHOR [+2]

Abstract

This is a vacuum chuck for holding a partial semiconductor wafer.

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Vacuum Chuck for Partial Semiconductor Wafers

This is a vacuum chuck for holding a partial semiconductor wafer.

As processed semiconductor wafers become more complex and costly, it is desirable to salvage broken wafers. Standard wafer chucks for holding a semiconductor wafer are designed to hold intact wafers and not readily adaptable to hold partial wafers. As illustrated in the drawing, partial wafer 10 is placed on the top surface of the chuck having a plurality of vacuum ports. The vacuum ports are normally held closed by spring-loaded balls 12, 14, 16 and 18. Partial wafer 10, when placed on the chuck, is used to depress balls 16 and 18 thereby opening the vacuum ports under the partial wafer. After completion of probing or other desired operations, the vacuum is turned off permitting the partial wafer to be popped up by the spring-loaded balls. The pattern of activated vacuum ports will, therefore, conform accurately to the irregular shape of the partial wafer, without the need for complex fluid logic to determine which of the ports should be activated.

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