Browse Prior Art Database

Gas Emission Scrubber

IP.com Disclosure Number: IPCOM000079416D
Original Publication Date: 1973-Jun-01
Included in the Prior Art Database: 2005-Feb-26
Document File: 2 page(s) / 31K

Publishing Venue

IBM

Related People

DiSanto, AJ: AUTHOR [+2]

Abstract

Gaseous discharge from epitaxial reactors present both an air pollution problem, as well as a problem relative to back pressure, when scrubbers are used for discharging gas from an epitaxial reactor. A proper emission scrubber must be able to remove HCL and prevent silicon dioxide buildup.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 2

Gas Emission Scrubber

Gaseous discharge from epitaxial reactors present both an air pollution problem, as well as a problem relative to back pressure, when scrubbers are used for discharging gas from an epitaxial reactor. A proper emission scrubber must be able to remove HCL and prevent silicon dioxide buildup.

As illustrated, a stack or pipe 10 through which gas is discharged in the direction of the arrow 11, is provided with a water spray nozzle 12 which projects into the pipe. The nozzle 12 effects a downward spray 13 of water onto a cone- shaped diffuser 14 having a plurality of angulated vanes 15 thereon. Due to the mixing action of the water and gas, the heavier particles in the gas agglomerate with the water and fall into a liquid holding and reprocessing tank, not shown, below the discharge 16 of the scrubber 10. By providing the flow of liquid in the same direction as the flow of gas, excessive back pressure on the equipment connected to the scrubber is prevented, and the gas is more completely scrubbed of the harmful particles.

1

Page 2 of 2

2

[This page contains 1 picture or other non-text object]