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Microscope Exposure of Photoresists

IP.com Disclosure Number: IPCOM000079523D
Original Publication Date: 1973-Jul-01
Included in the Prior Art Database: 2005-Feb-26
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Morgan, WM: AUTHOR

Abstract

Photomasks for defining micrometallurgy patterns are generally made by exposing a chromium coated glass plate covered with photoresist to the image of a master stencil, optically reduced to the size of the desired pattern. The exposed resist is developed and the chromium layer etched in a conventional manner to produce the photomask. The photomask itself is then used to produce a metallurgy pattern on a substrate by a similar process of photoetching.

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Microscope Exposure of Photoresists

Photomasks for defining micrometallurgy patterns are generally made by exposing a chromium coated glass plate covered with photoresist to the image of a master stencil, optically reduced to the size of the desired pattern. The exposed resist is developed and the chromium layer etched in a conventional manner to produce the photomask. The photomask itself is then used to produce a metallurgy pattern on a substrate by a similar process of photoetching.

Hitherto, modifications to the metallurgy pattern have required production of a new photomask and modifications of the mask itself have required production of a new stencil. It has now been found that minor modifications to such photomasks or to actual micrometallurgy patterns can be effected by a microscope.

The pattern or mask to be modified, is spin coated with photoresist and located on an X-Y traversable table beneath the microscope. The microscope, which may have a quartz-iodide or mercury arc light source, is fitted with an orange filter. Since the photoresist is not sensitive to orange light, the area to be modified can be identified by traversing the table beneath the microscope and viewing with an orange light.

When the area is located, the light spot size is selected by adjustment of the field iris diaphragm and/or the objective lens. The orange filter is removed and the required pattern of resist is exposed to light to which it is sensitive, by appropriate traversing of...