Browse Prior Art Database

Volumetric Dispensing System

IP.com Disclosure Number: IPCOM000079585D
Original Publication Date: 1973-Jul-01
Included in the Prior Art Database: 2005-Feb-26
Document File: 2 page(s) / 38K

Publishing Venue

IBM

Related People

Fox, DD: AUTHOR [+2]

Abstract

The pumpless dispensing of a metered amount of photolithographic process liquid to a processing vessel 1 from a supply reservoir 2 is accomplished by using an intermediate measuring tank 3, having a volume equal to the amount of liquid to be dispensed. Reservoir 2 is located below the level of vessel 1 and above tank 3. Tank 3 is filled with liquid from reservoir 2 through line 4 by gravity by moving three-way valve 5 to the vent position. The contents of tank 3, constituting a measured volume, are then dispensed into vessel 1 by nitrogen gas pressure introduced by moving three-way valve 5 to open nitrogen supply line 6 to capillary 7. Check valve 8 prevents the liquid from being forced back into reservoir 2. After use, the solution is removed from vessel 1 by opening drain valve 9.

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Volumetric Dispensing System

The pumpless dispensing of a metered amount of photolithographic process liquid to a processing vessel 1 from a supply reservoir 2 is accomplished by using an intermediate measuring tank 3, having a volume equal to the amount of liquid to be dispensed. Reservoir 2 is located below the level of vessel 1 and above tank 3. Tank 3 is filled with liquid from reservoir 2 through line 4 by gravity by moving three-way valve 5 to the vent position. The contents of tank 3, constituting a measured volume, are then dispensed into vessel 1 by nitrogen gas pressure introduced by moving three-way valve 5 to open nitrogen supply line 6 to capillary 7. Check valve 8 prevents the liquid from being forced back into reservoir 2. After use, the solution is removed from vessel 1 by opening drain valve 9.

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