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Oxidation Steam Tube

IP.com Disclosure Number: IPCOM000079601D
Original Publication Date: 1973-Aug-01
Included in the Prior Art Database: 2005-Feb-26
Document File: 2 page(s) / 23K

Publishing Venue

IBM

Related People

LaVanway, F: AUTHOR [+3]

Abstract

This steam generating apparatus utilizes the heat of an oxidation furnace for the purpose of generating steam, which is utilized in the furnace during the growth of silicon dioxide layers on semiconductor wafers. The apparatus has a steam generation tube 10 and a steam collection tube 12, joined together along their lengths, and in communication with each other by a slot along their lengths. The tubes 10 and 12 are mounted through wall 14 of the oxidation furnace with a slight downward slant, as shown. Tube 10 has an inlet 16 for deionized water to be converted the steam, and the generated steam is removed at end 18 of collection tube 12.

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Oxidation Steam Tube

This steam generating apparatus utilizes the heat of an oxidation furnace for the purpose of generating steam, which is utilized in the furnace during the growth of silicon dioxide layers on semiconductor wafers. The apparatus has a steam generation tube 10 and a steam collection tube 12, joined together along their lengths, and in communication with each other by a slot along their lengths. The tubes 10 and 12 are mounted through wall 14 of the oxidation furnace with a slight downward slant, as shown. Tube 10 has an inlet 16 for deionized water to be converted the steam, and the generated steam is removed at end 18 of collection tube 12.

In use, deionized water is trickled into tube 10 through inlet 16. The inlet flow may be controlled through use of a needle valve, not shown, connected to inlet
16. As water 20 trickles into tube 10, it is converted to steam 22, which flows through the slot joining tubes 10 and 12 into tube 12 to exit 18 of tube 12. This steam generator provides steam suitable for use in semiconductor oxidation processes in a highly efficient and contamination free manner.

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