Browse Prior Art Database

Deep Etching of Glass

IP.com Disclosure Number: IPCOM000079843D
Original Publication Date: 1973-Sep-01
Included in the Prior Art Database: 2005-Feb-26
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Burghardt, RW: AUTHOR

Abstract

A method of etching a pattern in LOF glass (Libbey-Owens-Ford Glass Co.) has been devised, which can etch sharply defined lines that are 60 microns deep.

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Deep Etching of Glass

A method of etching a pattern in LOF glass (Libbey-Owens-Ford Glass Co.) has been devised, which can etch sharply defined lines that are 60 microns deep.

The glass panel first is metalized with ~ 3000 -5000 of chrome metal. Then the panel is thoroughly cleaned using acetone, alcohol, distilled water, dried with filtered N(2), baked on a hot plate @ 85 degrees C for 5 min. and cooled to room temperature. A photoresist pattern is applied to the chrome metal and etched with HCL and H(2)O 1:1 @ 45 degrees C Any "pinhole" which might be present is then touched wit black wax. The panel is dried on a hot plate to 175 degrees
C.

The glass is then etched in a solution of HF-40% - H(2)O-60% at a rate of approx. 9 micron/minute. A constant change of fresh HF solution is necessary to assure clean etched lines. Although the back of the glass surface does not show signs of etching, a coating of black wax can be applied to prevent any unnecessary etching, if desired. After etching is complete, the photoresist is removed and the chrome mask etched away, leaving a clean, sharply defined pattern in the glass.

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