Browse Prior Art Database

Wafer Positioner

IP.com Disclosure Number: IPCOM000079911D
Original Publication Date: 1973-Sep-01
Included in the Prior Art Database: 2005-Feb-26
Document File: 2 page(s) / 33K

Publishing Venue

IBM

Related People

Bove, R: AUTHOR [+2]

Abstract

This apparatus eliminates damage to semiconductor wafers during handling on air conveying systems.

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Wafer Positioner

This apparatus eliminates damage to semiconductor wafers during handling on air conveying systems.

Use of air conveying systems for semiconductor wafer transporting has gained widespread usage due to its many advantages. One advantage is the lack of contacting the edge or top of the wafer 10. Accurate positioning, however, requires physical contact of the wafer which is transported by an air conveyor or linear Bernoulli effect. A wafer 10 then being conveyed by air is stopped prior to final positioning by vacuum stops A (see the drawing figures). The wafer is then released and allowed to "float" slowly into position, directed by air vents B against preloaded positioning springs C. The spring deflects and returns to the original position after stabilization, and the wafer 10 is positioned accurately by the springs.

The energy of the moving wafer is absorbed gradually by the springs C while they deflect over a period of time. This energy is not released quickly as would be the case of a fixed stop. The springs then act as a shock absorber where the maximum force or impact does not exceed that which would cause problems. By proper design of the cantilever springs, the spring constant can be below that which would cause impact damage. In addition to using a spring as an energy absorbing system, the contact surface can have a material to also absorb energy.

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