Browse Prior Art Database

Precleaning of Metal Oxide Masks

IP.com Disclosure Number: IPCOM000080121D
Original Publication Date: 1973-Jan-01
Included in the Prior Art Database: 2005-Feb-26
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Youlton, HG: AUTHOR

Abstract

Metal oxide masks for use in production of printed circuits or for semiconductor device manufacture are cleaned, prior to application of a photoresist, by first blowing off residual dust with oxygen free nitrogen, and then applying a uniform coating of hexamethyldisilazane (HMDS). Conveniently, the uniiorm layer of HMDS is produced by spinning the mask in a laminar flow cabinet for about twenty seconds at 2000 r.p.m.

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Precleaning of Metal Oxide Masks

Metal oxide masks for use in production of printed circuits or for semiconductor device manufacture are cleaned, prior to application of a photoresist, by first blowing off residual dust with oxygen free nitrogen, and then applying a uniform coating of hexamethyldisilazane (HMDS). Conveniently, the uniiorm layer of HMDS is produced by spinning the mask in a laminar flow cabinet for about twenty seconds at 2000 r.p.m.

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