Original Publication Date: 1973-Nov-01
Included in the Prior Art Database: 2005-Feb-27
AbstractA rapid, inexpensive method of completely removing photoresist from surfaces is described.
A rapid, inexpensive method of completely removing photoresist from surfaces is described.
A 2 molar solution of potassium hydroxide (KOH) in methanol is prepared, by weighing our 112 grams of KOH and dissolving this in 50 ml of water. Once the KOH is dissolved the solution is expanded to one liter by adding methanol.
The units covered with photoresist to be removed are placed in this solution and agitated for five minutes at ultrasonic frequencies. After removal from the solution, the units are rinsed with deionized water and dried in a centrifuge.
This process successfully removes all baked-on photoresist from the units.