Browse Prior Art Database

Photomask Protection by Oleophobic Films

IP.com Disclosure Number: IPCOM000080466D
Original Publication Date: 1973-Dec-01
Included in the Prior Art Database: 2005-Feb-27
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Palmer, MD: AUTHOR

Abstract

Photomasks, typically chromium plated glass substrates, may be treated to prevent pickup of photoresist material or other oleo based films during conventional photolithographic-masking processes. The photomask is immersed in a saturated solution of FREON* TF/(FC161) or FREON TF/(FCl34), rinsed in distilled ionized water and baked at 105 degrees C for ten (10) minutes.

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Photomask Protection by Oleophobic Films

Photomasks, typically chromium plated glass substrates, may be treated to prevent pickup of photoresist material or other oleo based films during conventional photolithographic-masking processes. The photomask is immersed in a saturated solution of FREON* TF/(FC161) or FREON TF/(FCl34), rinsed in distilled ionized water and baked at 105 degrees C for ten (10) minutes.

A photomask treated in this matter is oleophobic or adapted not to pickup conventional photoresist during photolithographic masking processes. Repeated use of such treated photomask has been found to lower defect levels on semiconductor devices. FREON FCl34 or FREON FCl61 may be readily removed from the photomask, by immersion in room temperature chromic acid. * Trademark of E. I. du Pont de Nemours & Co.

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