Browse Prior Art Database

Apparatus for Exposing Lines on a Photosensitive Surface

IP.com Disclosure Number: IPCOM000080589D
Original Publication Date: 1974-Jan-01
Included in the Prior Art Database: 2005-Feb-27
Document File: 3 page(s) / 75K

Publishing Venue

IBM

Related People

Wiley, JP: AUTHOR

Abstract

This is apparatus for exposing lines on a photosensitive surface by relative movement between a light beam and the surface, in which the quantity of radiant energy impinging upon the surface is controlled by movable, opaque blades that block variable portions of the light beam, with the blade movement being varied in accordance with the relative velocity between the beam and surface.

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Apparatus for Exposing Lines on a Photosensitive Surface

This is apparatus for exposing lines on a photosensitive surface by relative movement between a light beam and the surface, in which the quantity of radiant energy impinging upon the surface is controlled by movable, opaque blades that block variable portions of the light beam, with the blade movement being varied in accordance with the relative velocity between the beam and surface.

Referring to Fig. 1, the exposure apparatus includes light source 10 for producing a beam of actinic light 11, formed so to have an optical axis directed through condensing lens 12 and beam forming aperture 13. The beam is reflected from path-bending mirror 14, past control shutter mechanism 15 and through objective lens system 16 which forms an image of aperture 13 on photosensitive material 17. Photosensitive material 17 is supported for movement relative to impinging beam 11 on a X-Y table 18, having respective drive mechanisms 19 and 20, for producing movement of the table along Cartesian coordinates. Also encompassing beam 11, between aperture 13, and mirror 14, are a pair of blades 21 and 22 (Figs. 2A, 2B) mounted on respective arms 23 and 24 secured to galvanometric movements 25 and 26.

Each of the blades 21, 22 has a respective V-notch 21a, 22a formed in the edge of the blade adjacent the opposite blade. The blades are mounted for limited oscillatory movement toward and away from each other, from a position fully exposing reticle 13 or closing the reticle to a diamond-shaped aperture having a dimension equal to or slightly less than the minimum dimension of aperture 13. Galvanometric movements 25 and 26 are each controlled in accordance with the relative velocity between beam 11 and photosensitive material 17, during exposure of the latter.

Aperture...