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Vacuum Wafer Stop Release Apparatus

IP.com Disclosure Number: IPCOM000080724D
Original Publication Date: 1974-Feb-01
Included in the Prior Art Database: 2005-Feb-27
Document File: 2 page(s) / 26K

Publishing Venue

IBM

Related People

Gagne, M: AUTHOR [+2]

Abstract

Air track transport means requires stop and release capabilities for orderly transport, as well as facilitating intermittent processing steps.

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Vacuum Wafer Stop Release Apparatus

Air track transport means requires stop and release capabilities for orderly transport, as well as facilitating intermittent processing steps.

The vacuum apparatus shown in the figure illustrates in cross section, a means for accomplishing the facility where air track surface 1 contains a wafer 2 that is in a static position over a vacuum line 3. Line 3 is integral with cylinder section 4, which contains a plug 5 within the cylinder section or chamber. The plug 5 rests upon an appropriate spring 6, to allow the cylinder to remain in the lower portion of the chamber 4 with slight wall clearance, as indicated at 7.

Vacuum line 8 is connected to any suitable vacuum source. As pressure is reduced and the chamber 4 partially evacuated, the plug 5 rises to the top of the cylinder section 4 thereby covering vacuum line 8, whereupon atmospheric bleed line 9 allows the vacuum in line 3 to return to atmospheric pressure and release the wafer 2 upon the air track 1 to proceed in transport.

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