Browse Prior Art Database

Engraved Photoresist Masks

IP.com Disclosure Number: IPCOM000081264D
Original Publication Date: 1974-Apr-01
Included in the Prior Art Database: 2005-Feb-27
Document File: 2 page(s) / 29K

Publishing Venue

IBM

Related People

Marinace, JC: AUTHOR

Abstract

A Photoresist mask possessing low susceptibility to scratching is provided by the following process.

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Engraved Photoresist Masks

A Photoresist mask possessing low susceptibility to scratching is provided by the following process.

A transparent plate of glass, fused quartz, sapphire, or other suitable material is provided with a photoresist pattern using conventional photolithographic exposing and developing techniques. The plate 1, as shown in the figure, is then etched until depressions 2 are formed Where there was no etch preventing photoresist. After the photoresist is removed, depressions 2 are then filled, or partially filled, with a UV absorbing material 3. UV absorber 3 may be chosen from a variety of materials such as SiC, Cr(2)O(3):Cr, etc.

Elastomeric materials such as silicone rubber, pigmented or unpigmented, may prove to be particularly satisfactory for filling depressions 2 because they have a better scratch resistance than hard, brittle materials.

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