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Chemical Mechanical Polishing Silica Recrystallized Glass

IP.com Disclosure Number: IPCOM000081313D
Original Publication Date: 1974-May-01
Included in the Prior Art Database: 2005-Feb-27
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Ciarfella, A: AUTHOR [+2]

Abstract

The preparation of smooth, strain-free surfaces is an essential first step in the fabrication of silica-type recrystallized glass substrates. Described herein is a chemical-mechanical polishing method that has been found to be successful for generating such surfaces.

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Chemical Mechanical Polishing Silica Recrystallized Glass

The preparation of smooth, strain-free surfaces is an essential first step in the fabrication of silica-type recrystallized glass substrates. Described herein is a chemical-mechanical polishing method that has been found to be successful for generating such surfaces.

The initial or first surface on the silica-type recrystallized glass is formed by lapping the glass with 12u Al(2)O(3) lapping powders, suspended in a mixture of glycerine and water. The lapping process is complete when the surface has a uniform matter texture. Careful washing is essential for subsequent polishing.

Polishing to generate the final surface can be uniquely accomplished with alkaline slurries of silicon dioxide powders. Typical conditions for successful polishing of silica-type recrystallized glass materials are: 1) Abrasive Colloidal SiO(2).

2) pH of polishing Alkaline, pH 8-12.5.

solution

3) Polishing cloth Coriaceous cloth.

4) Wheel speed 50-150 rpm.

5) Pressure 0.5 psi.

6) Temperature Room temperature, but

polishing rate increases

rapidly with increase

in temperature.

7) Slurry composition from 5-50% SiO(2) by weight

in DI water.

Under these conditions, high-stock removal or polishing rates are achieved. The polishing action results from the removal of an intermediate chemical reaction product, formed in the alkaline-SiO(2) media, rather than the direct working of the primary glass surface.

This alkaline silicon dioxide chemic...