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Clear Film Cover Sheet to Improve Image Resolution of Dry Film Resist

IP.com Disclosure Number: IPCOM000081356D
Original Publication Date: 1974-May-01
Included in the Prior Art Database: 2005-Feb-27
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Archer, BH: AUTHOR [+3]

Abstract

The MYLAR* cover sheet used as a support for commercial dry photoresists may contain optical imperfections. Such imperfections may be eliminated by transferring the photoresist to a TEFLON* support prior to photo exposure. The procedure for transfer is as follows:. After laminating the photoresist on the workpiece using conventional procedures, remove the MYLAR cover layer at a clean work station. A second photoresist laminator with .001'' TEFLON, or any other optically clear film, is set up in a clean work station. Laminate the workpiece with optically clear film. (Temperature should not exceed 100 degrees F.) Trim excess film and complete normal process handling. * Trademarks of E. I. du Pont de Nemours & Co.

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Clear Film Cover Sheet to Improve Image Resolution of Dry Film Resist

The MYLAR* cover sheet used as a support for commercial dry photoresists may contain optical imperfections. Such imperfections may be eliminated by transferring the photoresist to a TEFLON* support prior to photo exposure. The procedure for transfer is as follows:. After laminating the photoresist on the workpiece using conventional procedures, remove the MYLAR cover layer at a clean work station. A second photoresist laminator with .001'' TEFLON, or any other optically clear film, is set up in a clean work station. Laminate the workpiece with optically clear film. (Temperature should not exceed 100 degrees
F.) Trim excess film and complete normal process handling. * Trademarks of E. I. du Pont de Nemours & Co.

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