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Sensitizer for Photoresist

IP.com Disclosure Number: IPCOM000081444D
Original Publication Date: 1974-Jun-01
Included in the Prior Art Database: 2005-Feb-28
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Deutermann, RM: AUTHOR [+3]

Abstract

To prevent loss of sensitivity in KPR-1* photoresist when used in a bath for resist dipping, an auxiliary sensitizer is necessary to maintain a reasonable exposure time. The 2-nitro-fluorene previously used as an auxiliary sensitizer can no longer be used, because of its carcinogenic properties. Xanthone has proved to be a very satisfactory substitute to raise the sensitivity of the resist when it drops to an unacceptable level. * Trademark of Eastman Kodak Company.

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Sensitizer for Photoresist

To prevent loss of sensitivity in KPR-1* photoresist when used in a bath for resist dipping, an auxiliary sensitizer is necessary to maintain a reasonable exposure time. The 2-nitro-fluorene previously used as an auxiliary sensitizer can no longer be used, because of its carcinogenic properties. Xanthone has proved to be a very satisfactory substitute to raise the sensitivity of the resist when it drops to an unacceptable level. * Trademark of Eastman Kodak Company.

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