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Sputtering of Amorphous Fe Gd Alloys

IP.com Disclosure Number: IPCOM000081742D
Original Publication Date: 1974-Jul-01
Included in the Prior Art Database: 2005-Feb-28
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Cuomo, JJ: AUTHOR [+3]

Abstract

Amorphous magnetic films of Gd-Fe can support stable magnetic bubble domains. These films can be prepared by sputtering under the following deposition conditions: Target composition GdFe Substrate 60 degrees off c-Al(2)O(3) or fused quartz Substrate temperature (degrees K) 77-300 RF power 200 watts on a 4 inch opening, or approximately 16 watts per square inch.

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Sputtering of Amorphous Fe Gd Alloys

Amorphous magnetic films of Gd-Fe can support stable magnetic bubble domains. These films can be prepared by sputtering under the following deposition conditions: Target composition GdFe
Substrate 60 degrees off c-Al(2)O(3) or fused quartz

Substrate temperature (degrees K) 77-300 RF power 200 watts on a 4 inch opening, or approximately 16 watts per

square inch.

Sputtering Gas Argon Argon pressure 15 microns
Interelectrode spacing 13/16"

Magnitude of magnetic field during sputtering Approximately 20 gauss Film thickness 500-6,000 Angstroms Deposition rate 5.8 Angstroms/sec at 300 degrees K and 6.5 angstroms/sec at 77'K.

Fe-Gd alloy compositions can be prepared in the amorphous state over wide compositional ranges. These materials have high magnetostriction constants, which permits easy adjustment of the magnitude of the anisotropy field with stress. Additionally, they exhibit a high magneto-optical rotation rate, thereby permitting easy detection by optical means.

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