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Forming Josephson Junctions with Improved Stability

IP.com Disclosure Number: IPCOM000082049D
Original Publication Date: 1974-Sep-01
Included in the Prior Art Database: 2005-Feb-28
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Greiner, JH: AUTHOR

Abstract

The interface between the tunnel barrier and the counter electrode is very important in Josephson tunneling devices. Adsorbed gases and weakly bonded species can react with the counter electrode and cause unwanted changes in the junction characteristics. In order to avoid this problem, it is proposed to prepare the tunnel barrier surface just prior to deposition of the counter electrode so that a stable interface results.

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Forming Josephson Junctions with Improved Stability

The interface between the tunnel barrier and the counter electrode is very important in Josephson tunneling devices. Adsorbed gases and weakly bonded species can react with the counter electrode and cause unwanted changes in the junction characteristics. In order to avoid this problem, it is proposed to prepare the tunnel barrier surface just prior to deposition of the counter electrode so that a stable interface results.

Sputter etching with an inert gas, such as argon, or bombarding the tunnel barrier surface by means including ion, electron, laser or X-ray beams can be used to sufficiently prepare the tunnel barrier surface. The experimental conditions can be adjusted so that undesirable material is preferentially removed from the surface of the tunnel barrier, to provide an additional advantage.

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