Browse Prior Art Database

Location of Electrically Conducting Regions in SiO2 Films

IP.com Disclosure Number: IPCOM000082132D
Original Publication Date: 1974-Oct-01
Included in the Prior Art Database: 2005-Feb-28
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Hufault, AD: AUTHOR [+2]

Abstract

This is a technique for detecting oxide defects in semiconductor devices. Essentially a weak solution of copper sulfate is dissolved in deionized water, which is used as a solution to electrolytically plate copper onto the defective regions of the device.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 74% of the total text.

Page 1 of 1

Location of Electrically Conducting Regions in SiO2 Films

This is a technique for detecting oxide defects in semiconductor devices. Essentially a weak solution of copper sulfate is dissolved in deionized water, which is used as a solution to electrolytically plate copper onto the defective regions of the device.

As a first specific technique, attach a semiconductor chip to a conductive holder using a conductive medium. Apply a drop of weak copper sulfate solution to the surface of the chip. Immerse a copper anode into the electrolyte solution and insure that the solution is electrically isolated from the substrate of the semiconductor chip. Apply a positive potential to the copper anode no greater than the use voltage of the semiconductor chip. The chip holder is maintained at ground potential. The defects are decorated in approximately 1 to 2 seconds and must be shielded from the surrounding light.

After copper plating has been accomplished, the chip is rinsed in deionized water and microscopically examined for the plated regions. The copper is then removed for further examination of the microscopic defect.

As an alternate specific technique, a copper compound is diluted in deionized water (for example, a 0.005 molar solution of copper sulfate). A semiconductor wafer or a portion of the semiconductor wafer is covered with this solution. A copper anode is immersed in the electrolytic solution and the water is negatively biased, making it the cathode. The amount o...