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Radiation Sensitive Polyesters

IP.com Disclosure Number: IPCOM000082206D
Original Publication Date: 1974-Oct-01
Included in the Prior Art Database: 2005-Feb-28
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Johnson, DE: AUTHOR [+2]

Abstract

A successful positive resist must be sensitive to radiation, for example, radiation such as ultraviolet (UV), gamma, E-Beam and X-ray. The polyester described herein does decompose via radiation and, furthermore, it can be cast into thin films. This polymer was prepared from 3-hydroxy-2, 2,4-trimethyl-3-pentanoic acid-Beta -lactone (dimer of dimethyl ketene) by an anionic polymerization.

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Radiation Sensitive Polyesters

A successful positive resist must be sensitive to radiation, for example, radiation such as ultraviolet (UV), gamma, E-Beam and X-ray. The polyester described herein does decompose via radiation and, furthermore, it can be cast into thin films. This polymer was prepared from 3-hydroxy-2, 2,4-trimethyl-3- pentanoic acid-Beta -lactone (dimer of dimethyl ketene) by an anionic polymerization.

The polymer has a unique structure which lends itself to degradation via radiation. The quaternary carbon is alpha to a carbonyl, has gem dimethyl groups and is an allylic carbon. Preparation of the polyester using a sodium methoxide catalyst has yielded a polymer, which decomposed within a few minutes under UV light to low-molecular weight products which were soluble in pentane.

Longer exposures actually caused the polymer to decompose and the reaction products evaporated.

The polymer was not soluble in pentane, a desirable characteristic for a resist material. Gamma radiation (5 megarads) decreased the molecular weight of a solid sample by a factor of 4.

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