Browse Prior Art Database

Continuous Monitoring of Plating Bath Plating Rate

IP.com Disclosure Number: IPCOM000082263D
Original Publication Date: 1974-Nov-01
Included in the Prior Art Database: 2005-Feb-28
Document File: 2 page(s) / 27K

Publishing Venue

IBM

Related People

Canestaro, MJ: AUTHOR

Abstract

The present method relates to a monitoring scheme wherein continuous thickness measurements are made in a plating bath, by the use of one side measuring devices such as a Vidigage(R) or a Betascope(R).

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Continuous Monitoring of Plating Bath Plating Rate

The present method relates to a monitoring scheme wherein continuous thickness measurements are made in a plating bath, by the use of one side measuring devices such as a Vidigage(R) or a Betascope(R).

The probe of these devices is lowered into a well which has a bottom made of the material being plated. This will protect the probe from the plating bath, and when immersed in the bath, the increasing thickness of the bottom is measured by the probe.

The drawing shows the well and probe in an electroless bath by making the well an electrode. The method will also work for electrolytic plating.

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