Browse Prior Art Database

Wafer Contamination Detection System

IP.com Disclosure Number: IPCOM000082269D
Original Publication Date: 1974-Nov-01
Included in the Prior Art Database: 2005-Feb-28
Document File: 2 page(s) / 50K

Publishing Venue

IBM

Related People

Ross, T: AUTHOR

Abstract

This system scans semiconductor wafers for contamination automatically without introducing any further contamination.

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Wafer Contamination Detection System

This system scans semiconductor wafers for contamination automatically without introducing any further contamination.

By using a Quantimet Image Analyzing Computer* for detection of contamination and a special hood which encloses the microscope and pedestal, a wafer can be scanned, mapped and sized for contamination. The wafer is then carried in a special container and put through a desired process, such as diffusion. It is then taken back to the system where it is scanned again for contamination. In this way, the level of contamination in the process can be established quickly and accurately.

The bright and dark field lamps are preierably 100 Watt and 450 Watt Xenon lamps, respectively. The oblique lens ensures the detection of extremely small particles. * A product of IMANCO Corporation, Monsey, New York

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