Browse Prior Art Database

Variable Angle Wafer Holder

IP.com Disclosure Number: IPCOM000082466D
Original Publication Date: 1974-Dec-01
Included in the Prior Art Database: 2005-Feb-28
Document File: 2 page(s) / 38K

Publishing Venue

IBM

Related People

Keenan, WA: AUTHOR [+2]

Abstract

The angle that the wafer surface makes with the ion beam is an important process parameter in ion implantation. A two-disk wafer holder is described that allows quick and accurate variation of the wafer orientation with respect to the ion beam.

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Variable Angle Wafer Holder

The angle that the wafer surface makes with the ion beam is an important process parameter in ion implantation. A two-disk wafer holder is described that allows quick and accurate variation of the wafer orientation with respect to the ion beam.

The wafer holder is comprised of two pieces of cylindrical stock machined as shown in Fig. 1. The diameter must be larger than the wafer, and the angle alpha between the inclined face A and the bottom B is determined by the total variation required, 2 alpha. The center line of fastener hole D is perpendicular to face A.

The variable-angle wafer holder is assembled, Fig. 2, using a spring C and fastener E to allow easy rotation of the parts. As shown in Fig. 2, the two faces B and D are parallel and the change in angle is zero. By rotating one piece with respect to the other by 180 degrees this angle is varied from zero to 2 alpha, as shown in Fig. 3.

The vertical scribe marks F along the side of the bottom piece H divide the perimeter into N equal parts, which allows the total orientation variation 2 alpha to be divided into N/2 parts. Moving the indicator G on the top piece J one division changes the angle between faces B and D 4 alpha/N degrees.

Face B is attached to the wafer holder in the implant machine. The wafer is then attached to face D in any one of the standard ways.

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