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Browse Prior Art Database

Smoothing Dielectrics

IP.com Disclosure Number: IPCOM000082576D
Original Publication Date: 1975-Jan-01
Included in the Prior Art Database: 2005-Feb-28
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Silkensen, RD: AUTHOR [+2]

Abstract

Sputter deposition of dielectrics in thin-film operations provides a simple and useful fabrication technique.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

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Smoothing Dielectrics

Sputter deposition of dielectrics in thin-film operations provides a simple and useful fabrication technique.

In some applications, it is desirable to have dielectric with extremely smooth surfaces. Sputter etching dielectric materials provides a smooth surface. For example, alumina (Al(2)O(3)) dielectric can be provided with a smooth surface, by sputter etching under ten microns argon pressure at 1,300 volts (cathode to ground), and 140mA for a period of about ten minutes.

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