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Water Injection System for Thermal Oxidation of Semiconductors

IP.com Disclosure Number: IPCOM000082823D
Original Publication Date: 1975-Feb-01
Included in the Prior Art Database: 2005-Feb-28
Document File: 2 page(s) / 46K

Publishing Venue

IBM

Related People

Kemnitz, KH: AUTHOR [+2]

Abstract

This system allows oxide growth rates to be readily adjusted by adjusting the oxygen/water/gas ratio inside the oxidation furnace. The partial water pressure in the system is adjusted by controlling the injected water flow. As it is possible to maintain a certain oxide growth rate for an unlimited period of time, the system is suitable both for continuous and for batch processes.

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Water Injection System for Thermal Oxidation of Semiconductors

This system allows oxide growth rates to be readily adjusted by adjusting the oxygen/water/gas ratio inside the oxidation furnace. The partial water pressure in the system is adjusted by controlling the injected water flow. As it is possible to maintain a certain oxide growth rate for an unlimited period of time, the system is suitable both for continuous and for batch processes.

An oxidation furnace is provided with a water injection capillary. Through this the water flow is fed into the furnace. The water injection capillary is surrounded by a tube through which the oxygen is fed into the furnace. Fine metering valves and flowmeters are provided for controlling and metering the water and oxygen flow rates. When a syringe or a hose gauge pump is used instead of the water flowmeter, the system is suitable for continuous processes.

The oxygen line inlet allows hydrochloric acid gas being admixed to the reaction gas for sodium ion gettering and heavy metal chlorination, thus reducing surface energy states. The water flowmeter is followed by a cation exchanger to prevent minute cation contamination of the system. Before entering the oxidation furnace, the oxygen and the deionized water flow are filtered by 0.22 Mu m membrane filters. The filtered water is ducted into the furnace through the injection capillary connected to a quartz capillary, which feeds the water flow into the evaporation device inside...