Browse Prior Art Database

Wafer Handling System

IP.com Disclosure Number: IPCOM000082968D
Original Publication Date: 1975-Mar-01
Included in the Prior Art Database: 2005-Feb-28
Document File: 2 page(s) / 47K

Publishing Venue

IBM

Related People

Musits, B: AUTHOR [+2]

Abstract

Shown is an air track system 1 that is physically connected at 2 to a main air track system 3. A production wafer 4 is released from a main air track assembly, enters into the air track subsystem 1, is carried by the directional laminar air flow to the assigned station, and onto wafer station 5 for appropriate processing. After the wafer is subjected to the processing, it returns onto the main air track 3 and follows the direction of the air flow until it reaches the main system assembly.

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Wafer Handling System

Shown is an air track system 1 that is physically connected at 2 to a main air track system 3. A production wafer 4 is released from a main air track assembly, enters into the air track subsystem 1, is carried by the directional laminar air flow to the assigned station, and onto wafer station 5 for appropriate processing. After the wafer is subjected to the processing, it returns onto the main air track 3 and follows the direction of the air flow until it reaches the main system assembly.

The air track system ] is equipped with storage space (buffer zone) 6, 7 and 8 for one or more production wafers and two calibration wafers. The storage capability has dual directional and crossing features combined with computer or central control.

On demand, the wafer can be programmed to be transported from the wafer station 5 and stored in the preselected buffer zone (6, 7 and 8), or returned to the main air track system 3, if required. Also, a calibration wafer can be called to station 5 for calibration purposes and ordered to return to its original place.

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