Browse Prior Art Database

Gas Panel MgO Surface In Situ Cleaning

IP.com Disclosure Number: IPCOM000082980D
Original Publication Date: 1975-Mar-01
Included in the Prior Art Database: 2005-Feb-28
Document File: 2 page(s) / 26K

Publishing Venue

IBM

Related People

Flitsch, R: AUTHOR

Abstract

Shown is RF plasma etching of assembled gas panels before backfill and sealing, which eliminates 16 hours of baking. Gas 2 is leaked into the Panel and clean vacuum 4 is supplied to establish operating and exhausting conditions. The RF generator is properly tuned and gas pressure set for optimum conditions. In this way RF plasma etching can reduce surface contaminants to gas panel MgO surfaces.

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Gas Panel MgO Surface In Situ Cleaning

Shown is RF plasma etching of assembled gas panels before backfill and sealing, which eliminates 16 hours of baking. Gas 2 is leaked into the Panel and clean vacuum 4 is supplied to establish operating and exhausting conditions. The RF generator is properly tuned and gas pressure set for optimum conditions. In this way RF plasma etching can reduce surface contaminants to gas panel MgO surfaces.

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