Browse Prior Art Database

Developers for Polysulfone Terpolymer Resists

IP.com Disclosure Number: IPCOM000083195D
Original Publication Date: 1975-Apr-01
Included in the Prior Art Database: 2005-Mar-01
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Chiu, GT: AUTHOR

Abstract

Submicron films of polysulfone terpolymer resists, such as terpolymers of cyclopentene/sulfur dioxide/and butene-1 or trans-2-butene or cis-2-butene are exposed imagewise to high energy, degrading radiation.

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Developers for Polysulfone Terpolymer Resists

Submicron films of polysulfone terpolymer resists, such as terpolymers of cyclopentene/sulfur dioxide/and butene-1 or trans-2-butene or cis-2-butene are exposed imagewise to high energy, degrading radiation.

High-resolution images are then developed by removing the exposed portion of the films with an organic developer, which is a mixture of cyclohexanone and cycloheptanone in ratios ranging from 50/50 to 15/85 by volume.

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