Browse Prior Art Database

Resist Adhesion Promoters

IP.com Disclosure Number: IPCOM000083197D
Original Publication Date: 1975-Apr-01
Included in the Prior Art Database: 2005-Mar-01
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Cortellino, CA: AUTHOR

Abstract

The adherence of resist layers to surfaces such as phosphosilicate glass is improved by precoating the surface with alkyl-2-cyanoacrylate.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 1

Resist Adhesion Promoters

The adherence of resist layers to surfaces such as phosphosilicate glass is improved by precoating the surface with alkyl-2-cyanoacrylate.

A 50% by weight solution of methyl-2-cyanoacrylate in xylene solution is applied to the phosphosilicate glass surface layer of a semiconductor substrate. The substrate is spun at 2000 RPM for 5 seconds, at 6000 RPM for 5 seconds, and at 8000 RPM for 50 seconds.

The coating is dried at 65 degrees C for 15 minutes and a polymethyl methacrylate resist layer is applied. The resist, a 12,000 angstrom polymethyl methacrylate film, showed no adhesion failure after exposure, development and substrate etching.

1