Browse Prior Art Database

Cleaning Mixture

IP.com Disclosure Number: IPCOM000083206D
Original Publication Date: 1975-Apr-01
Included in the Prior Art Database: 2005-Mar-01
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Guitard, BJ: AUTHOR

Abstract

In semiconductor manufacturing, it is necessary to clean tooling with a cleaning composition having antielectrostatic properties.

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Cleaning Mixture

In semiconductor manufacturing, it is necessary to clean tooling with a cleaning composition having antielectrostatic properties.

The following cleaning composition, prepared from electronic grade ingredients, presents excellent antielectrostatic properties: Component percentage by volume - Isopropyl alcohol 5 to 15% - TRITON* (surfactant based on alkylaryl polyether alcohols, 0,1 to 1% sulfonate or sulfates) - Deionized water 84 to 94,9% * Trademark of Rohm and Haas Company.

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