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Browse Prior Art Database

Making an Array of Josephson Junctions

IP.com Disclosure Number: IPCOM000083793D
Original Publication Date: 1975-Jul-01
Included in the Prior Art Database: 2005-Mar-01
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Daetwyler, K: AUTHOR [+2]

Abstract

When a plurality of Josephson junctions are arranged on the same substrate wafer, it is difficult to obtain equal characteristics for all junctions Part of the difficulty goes back to the RF oxidation process used for producing isolation layers on metal electrodes. The glow discharge which causes the oxidation is not sufficiently uniform across the wafer surface.

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Making an Array of Josephson Junctions

When a plurality of Josephson junctions are arranged on the same substrate wafer, it is difficult to obtain equal characteristics for all junctions Part of the difficulty goes back to the RF oxidation process used for producing isolation layers on metal electrodes. The glow discharge which causes the oxidation is not sufficiently uniform across the wafer surface.

Uniformity of junctions can be improved by metallic interconnection of all electrodes on the wafer surface that are to be covered with insulating oxide. A further improvement can be achieved by conductive interconnection of all layers on a substrate, as well as all substrates arranged within the same reactor.

When the oxidation is completed, the interconnection between the different junctions can be removed. Alternately, it can constitute a homogeneous base electrode for all junctions on one wafer.

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